An edition of Thin film materials, processes, and reliability (2003)
Thin Film Materials, Processes, and Reliability
By International Symposium on Thin Film Materials, Processes, and Reliability (2003 Paris, France),G. Mathad,T. Cale,H. Rathore
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Publish Date
September 2003
Publisher
Electrochemical Society
Language
-
Pages
424
1-2 of 2 Editions
Thin Film Materials, Processes, and Reliability
Published In: September 2003
Publisher: Electrochemical Society
Thin film materials, processes, and reliabilityplasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium
Language: eng
Pages: 424
Published In: 2003
Publisher: Electrochemical Society