An edition of X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography (1991)

X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography

9-13 July 1990, San Diego, California

By Richard B. Hoover

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Publish Date

1991

Publisher

SPIE

Language

eng

Pages

579

Description:

subjects: Congresses, X-ray lithography, Instruments, Coatings, Polarimetry, X-ray optics, Extreme ultraviolet lithography, X-ray astronomy, X-ray microscopes, Optical images, Ultraviolet astronomy, Optical instruments