An edition of Computational lithography (2010)
Computational lithography
By Xu Ma
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Publish Date
2010
Publisher
Wiley
Language
eng
Pages
226
Description:
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting.