Detailed kinetic modeling of the chemical vapor deposition of silicon dioxide and tin oxide films

An edition of Detailed kinetic modeling of the chemical vapor deposition of silicon dioxide and tin oxide films (1989)

Detailed kinetic modeling of the chemical vapor deposition of silicon dioxide and tin oxide films

By Carmen Joseph Giunta

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Publish Date

1989

Publisher

Language

eng

Pages

209

Description:

subjects: Silicon oxide films, Vapor-plating