Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor
An edition of Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor (1983)
final report covering period October 11, 1982 to May 21, 1983
By Arvid N. Arvidson
Publish Date
1983
Publisher
Hemlock Semiconductor Corporation,National Technical Information Service
Language
eng
Pages
-
1-1 of 1 Editions
Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor
Language: eng
Published In: 1983
Publisher: Hemlock Semiconductor Corporation, National Technical Information Service