Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor

An edition of Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor (1983)

Development of a polysilicon process based on chemical vapor deposition of dichlorosilane in an advanced Siemen's reactor

final report covering period October 11, 1982 to May 21, 1983

By Arvid N. Arvidson

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Publish Date

1983

Publisher

Hemlock Semiconductor Corporation,National Technical Information Service

Language

eng

Pages

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