Advanced Ta-based diffusion barriers for Cu interconnects

An edition of Advanced Ta-based diffusion barriers for Cu interconnects (2008)

Advanced Ta-based diffusion barriers for Cu interconnects

By Rene Hubner

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Publish Date

2008

Publisher

Nova Science Publishers

Language

eng

Pages

-

Description:

subjects: Electrodiffusion, Integrated circuits, Interconnects (Integrated circuit technology), Diffusion