An edition of Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses (2002)
Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses
Fundamental Mechanisms and Application to IC Interconnect Technology
By Christopher L. Borst,Christopher Lyle Borst,William N. Gill,Ronald J. Gutmann
Publish Date
September 30, 2002
Publisher
Springer
Language
eng
Pages
243
1-4 of 4 Editions
Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses
Language: eng
Published In: 2013
Publisher: Springer London, Limited
Pages: 243
Published In: Feb 23, 2014
Publisher: Springer
Language: eng
Pages: 248
Published In: September 30, 2002
Publisher: Springer
Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses
Language: eng
Pages: 229
Published In: 2002
Publisher: Kluwer Academic Publishers