An edition of Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses (2002)
Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses
Fundamental Mechanisms and Application to IC Interconnect Technology
By Christopher L. Borst,Christopher Lyle Borst,William N. Gill,Ronald J. Gutmann
Publish Date
September 30, 2002
Publisher
Springer
Language
eng
Pages
243
Description:
subjects: Polishing, Semiconductors, Grinding and polishing, Interconnects (Integrated circuit technology), Plastics & polymers technology, Science/Mathematics, Integrated Circuits, Technology, Technology & Industrial Arts, Chemistry - Organic, Electronics - Semiconductors, Engineering - Electrical & Electronic, Science-Chemistry - Organic, Technology / Electronics / Semiconductors, Technology / Engineering / Industrial, Technology-Engineering - Electrical & Electronic, Electronics - Circuits - Integrated, Interconnects (Integrated circ, Chemical mechanical planarization