An edition of Principles of chemical vapor deposition (2003)
Principles of Chemical Vapor Deposition
By Daniel Mark Dobkin,D.M. Dobkin,M.K. Zuraw
0 (0 Ratings)
0 Want to read0 Currently reading0 Have read
0 Want to read0 Currently reading0 Have read
Publish Date
April 1, 2003
Publisher
Springer
Language
eng
Pages
281
Description:
subjects: Vapor-plating, Refractory coating, Engineering: general, Metals technology / metallurgy, Engineering - Industrial, Science, Technology & Industrial Arts, Science/Mathematics, Technical & Manufacturing Trades, Physics, Technology / Material Science, Technology / Technical & Manufacturing Industries & Trades, Chemistry - General, Material Science