An edition of Rapid thermal annealing/chemical vapor deposition and integrated processing (1989)

Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing

Volume 146

By Martin L. Green,Jeffrey C. Gelpey

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Publish Date

2014

Publisher

University of Cambridge ESOL Examinations,Cambridge University Press

Language

eng

Pages

506

Description:

subjects: Semiconductor doping, Heat treatment, Vapor plating, Rapid thermal processing, Congresses, Semiconductors, Vapor pressure, Vapor-plating, Diffusion