An edition of LPCVD silicon nitride and oxynitride films (1991)
LPCVD silicon nitride and oxynitride films
material and applications in integrated circuit technology
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Publish Date
1991
Publisher
Springer-Verlag
Language
eng
Pages
159
Description:
subjects: Complementary Metal oxide semiconductors, Thin film devices, Silicon nitride, Materials, Very large scale integration, Integrated circuits, UE/CE Union européenne, Technologie électronique, Microélectronique, ESPRIT (Programme), LPCVD-Verfahren, Siliciumnitrid, Integrierte Schaltung, Aufsatzsammlung, Siliciumoxinitride, Dünne Schicht, Dampfabscheidung, Microelectronics