An edition of LPCVD silicon nitride and oxynitride films (1991)
LPCVD silicon nitride and oxynitride films
material and applications in integrated circuit technology
By
0 (0 Ratings)
0 Want to read0 Currently reading0 Have read
0 Want to read0 Currently reading0 Have read
Publish Date
1991
Publisher
Springer-Verlag
Language
eng
Pages
159
1-1 of 1 Editions
LPCVD silicon nitride and oxynitride filmsmaterial and applications in integrated circuit technology
Language: eng
Pages: 159
Published In: 1991
Publisher: Springer-Verlag