An edition of Advances in research and development (1995)
Advances in Research and Development, Volume 23
Modeling of Film Deposition for Microelectronic Applications (Thin Films)
By Maurice H. Francombe,John L. Vossen
Publish Date
September 29, 1997
Publisher
Academic Press
Language
eng
Pages
311
1-5 of 5 Editions
Advances in Research and Development
Language: eng
Published In: 1997
Publisher: Elsevier Science & Technology Books
Advances in Research and Development
Language: eng
Published In: 1997
Publisher: Elsevier Science & Technology Books
Advances in Research and Development
Language: eng
Pages: 387
Published In: 1995
Publisher: Elsevier Science & Technology Books
Language: eng
Pages: 311
Published In: September 29, 1997
Publisher: Academic Press
Language: eng
Pages: 311
Published In: September 29, 1997
Publisher: Academic Press