An edition of Advances in research and development (1995)
Advances in Research and Development, Volume 23
Modeling of Film Deposition for Microelectronic Applications (Thin Films)
By Maurice H. Francombe,John L. Vossen
0 (0 Ratings)
0 Want to read0 Currently reading0 Have read
0 Want to read0 Currently reading0 Have read
Publish Date
September 29, 1997
Publisher
Academic Press
Language
eng
Pages
311
RelatedBooks