An edition of Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics Vol. 567 (1999)
Ultrathin Sio2 and High-K Materials for Ulsi Gate Dielectrics
Symposium Held April 5-8, 1999 San Francisco, California, U.S.A. (Materials Research Society Symposium Proceedings)
By H. R. Huff
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Publish Date
September 1999
Publisher
Materials Research Society
Language
eng
Pages
615
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