Emerging Lithographic Technologies for Nanopatterning
An edition of Emerging Lithographic Technologies for Nanopatterning (2008)
By Ampere A. Tseng,Walt Trybula
Publish Date
2010
Publisher
Taylor & Francis Group
Language
eng
Pages
700
Description:
subjects: Lithography, electron beam, X-ray lithography, X-rays, industrial applications, Masks (electronics), Nanostructures, Nanotechnology