An edition of MOS Interface Physics Process and Characterization (2021)
MOS Interface Physics, Process and Characterization
By Shengkai Wang,Xiaolei Wang
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Publish Date
2021
Publisher
CRC Press LLC
Language
eng
Pages
200
Description:
subjects: Engineering, Metal oxide semiconductors, Design and construction, Mathematics, Semiconductors, Junctions, Integrated circuits, Research, Solid state physics, Experiments, Semi-conducteurs, Jonctions, Circuits intégrés, Recherche, Physique de l'état solide, Expériences, TECHNOLOGY / General, TECHNOLOGY / Electronics / General, TECHNOLOGY / Electronics / Microelectronics