An edition of Techniques and challenges for 300 mm silicon (1999)
Techniques and Challenges for 300 mm Silicon
Processing, Characterization, Modelling and Equipment (European Materials Research Society Symposia Proceedings)
By Symposium F on Techniques and Challenges for 300 mm Silicon (1998 Strasbourg, France)
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Publish Date
September 1, 1999
Publisher
Elsevier Science
Language
eng
Pages
206
Description:
subjects: Congresses, Semiconductor wafers, Semiconductors