An edition of Electron-Beam, X-Ray, and Ion-Beam Technology (1990)
Electron-beam, X-ray, and ion-beam technology
submicrometer lithographies IX : 7-8 March 1990, San Jose, California
By Douglas J. Resnick
0 (0 Ratings)
0 Want to read0 Currently reading0 Have read
0 Want to read0 Currently reading0 Have read
Publish Date
1990
Publisher
SPIE--the International Society for Optical Engineering
Language
eng
Pages
344
1-2 of 2 Editions
Electron-beam, X-ray, and ion-beam technologysubmicrometer lithographies IX : 7-8 March 1990, San Jose, California
Language: eng
Pages: 344
Published In: 1990
Publisher: SPIE--the International Society for Optical Engineering
Electron-Beam, X-Ray, and Ion-Beam Technology
Electron-Beam, X-Ray, and Ion-Beam TechnologySubmicrometer Lithographies IX (Spie Proceedings , Vol 1263)
Published In: December 1990
Publisher: SPIE-International Society for Optical Engine