An edition of Electron-Beam, X-Ray, and Ion-Beam Technology (1990)
Electron-beam, X-ray, and ion-beam technology
submicrometer lithographies IX : 7-8 March 1990, San Jose, California
By Douglas J. Resnick
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Publish Date
1990
Publisher
SPIE--the International Society for Optical Engineering
Language
eng
Pages
344
Description: