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photoresists

Photopolymers

By Kenichiro Nakamura

Advances in Resist Technology and Processing IX

By Anthony E. Novembre

Advances in Resist Technology and Processing VIII

By Hiroshi Ito

Advance in Resist Technology and Processing XIII

By Roderick R. Kunz

Advances in Resist Technology and Processing VII

By Michael P. C. Watts

Advances in Resist Technology and Processing XV

By Will Conley

Microlithography 1999: Advances in Resist Technology and Processing XVI

By Will Conley

Advances in Resist Technology and Processing XVII (Advances in Resist Technology & Processing)

By Francis M. Houlihan

Advances in Resist Technology and Processing XII

By Robert D. Allen

Advances in resist technology and processing V

By

Advances in resist technology and processing XIV

By

Advances in resist materials and processing technology XXIV

By Qinghuang Lin

Optical Laser Microlithography VIII

By Brunner

Polymers for high technology

By S. Richard Turner

Introduction to microlithography

By Larry F. Thompson,Murrae J. Bowden,C. Grant Willson

Proceedings of the symposia on Patterning Science and Technology II [and] Interconnection and Contact Metallization for ULSI

By International Symposium on Patterning Science and Technology (2nd 1991 Phoenix, Ariz.)

Advances in Resist Technology and Processing, IV

By Murrae J. Bowden

Semiconductor Lithography

By Wayne M. Moreau

Interface '81

By Eastman Kodak Company

Dry film photoresist from Japan

By United States International Trade Commission

Advances in Resist Technology and Processing VI

By Elsa Reichmanis

Microelectronics technology

By Elsa Reichmanis,Christopher K. Ober

Materials for microlithography

By

Polymers in microlithography

By Elsa Reichmanis