Advances and challenges in chemical mechanical planarization

An edition of Advances and challenges in chemical mechanical planarization (2007)

Advances and challenges in chemical mechanical planarization

symposium held April 10-12, 2007, San Francisco, California, U.S.A.

By Symposium C, "Advances and Challenges in Chemical Mechanical Planarization" (2007 San Francisco, Calif.)

0 (0 Ratings)

0 Want to read0 Currently reading0 Have read

Publish Date

2007

Publisher

Materials Research Society, c2007.

Language

eng

Pages

371

Description:

subjects: Surfaces, Chemical mechanical planarization, Semiconductors, Congrès, Semiconducteurs, Materials, Congresses, Chimie des surfaces, Défauts, Grinding and polishing