An edition of Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III (1993)

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III

1-2 March 1993, San Jose, California

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Publish Date

1993

Publisher

The Society

Language

eng

Pages

470

Description:

subjects: Electron beam Lithography, Congresses, Etching, Ion beam lithography, X-ray lithography, Semiconductors, Masks (Electronics)