

An edition of VLSI and Post-CMOS Electronics (2019)
Design, Modelling and Simulation
By Rohit Dhiman,Rajeevan Chandel
Publish Date
2019
Publisher
Institution of Engineering & Technology,The Institution of Engineering and Technology
Language
eng
Pages
378
Description:
subjects: Integrated circuits, very large scale integration, Metal oxide semiconductors, complementary, Integrated circuits, Very large scale integration, Complementary Metal oxide semiconductors, Circuits intégrés à très grande échelle, MOS complémentaires, CMOS integrated circuits, Elemental semiconductors, Integrated circuit design, Low-power electronics, Magnetoelectronics, MOSFET, Signal processing, Silicon, Thin film transistors, Tunnel field-effect transistors, Dielectric measurements, Dielectrics, Electric resistance, Electronic apparatus and appliances, Computer-aided design, Design and construction, Metal oxide semiconductor field-effect transistors, Semiconductors, Mesures diélectriques, Diélectriques, Résistance électrique, Circuits intégrés, Conception assistée par ordinateur, Conception et construction, Transistors MOSFET, Semi-conducteurs, Silicium, Resistivity, Semiconductor, III-V semiconductors, Permittivity, Semiconductor device models, SRAM chips, Technology CAD (electronics), Three-dimensional integrated circuits, VLSI