Cover of Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

An edition of Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications (1992)

Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications

By John E. J. Schmitz

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Publish Date

1992

Publisher

Noyes Publications

Language

eng

Pages

235

Description:

subjects: Integrated circuits, Materials, Tungsten, Ultra large scale integration, Vapor-plating, Very large scale integration, Integrated circuits, very large scale integration, Integrated circuits, ultra large scale integration