An edition of Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI (1996)

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI

11-13 March 1996, Santa Clara, California

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Publish Date

1996

Publisher

SPIE

Language

eng

Pages

412

Description:

subjects: Electron beam Lithography, Congresses, Integrated circuits, Ion beam lithography, X-ray lithography, Masks, Extreme ultraviolet lithography, Masks (electronics), Lithography, electron beam