An edition of Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V (1995)

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V

20-21 February 1995, Santa Clara, California

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Publish Date

1995

Publisher

SPIE

Language

eng

Pages

450

Description:

subjects: Electron beam Lithography, Congresses, Integrated circuits, Ion beam lithography, X-ray lithography, Masks, Extreme ultraviolet lithography, Lithography, electron beam, Masks (electronics)