An edition of Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV (1994)

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV

28 February-1 March 1994, San Jose, California

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Publish Date

1994

Publisher

SPIE

Language

eng

Pages

420

Description:

subjects: Electron beam Lithography, Congresses, Etching, Ion beam lithography, X-ray lithography, Semiconductors, Masks (Electronics), Lithography, electron beam