An edition of Gate stack and silicide issues in silicon processing (2000)

Gate Stack and Silicide Issues in Silicon Processing

Symposium Held April 25-27, 2000, San Francisco, California, U.S.A (Materials Research Society Symposia Proceedings, V. 611.)

By Symposium on Gate Stack and Silicide Issues in Silicon Processing (2000 San Francisco, CA)

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Publish Date

July 2000

Publisher

Materials Research Society

Language

eng

Pages

236

Description:

subjects: Congresses, Electric leakage, Gate array circuits, Integrated circuits, Ultra large scale integration, Materials, Silicides, Ultra large scale integration Integrated circuits, Silicon, Integrated circuits, Ultra large scale integration